VELA 3 FIB-SEM

The  VELA  FIBxSEM  is a favorable combination of the electron and ion sources and optical columns attached on one chamber. It extends imaging qualities of the scanning electron microscope with the possibility of surface modification by a focused ion beam.

System Description

System has a fully integrated software control SEM / FIB / GIS for all jobs
Powerfull DrawBeam lithography module for pattern programming
System is built upon the extra large specimen chamber with optimized microanalytical ports.

SEM Part

The SEM column on the is based on the VEGA 3 Wide Field Optics^TM design  with  tungsten heated filament electron gun. Newly Implemented  In-Flight Beam Tracing™  for higher system performance and beam optimization.

• Imaging function
  
• Micro-analytical function
  
• Navigation function
  
• E-Beam lithography available with an optional Beam Blanker
  

FIB Part

A unique ion optic column differentially pumped (2 ion pumps) for ultra-low ion scattering effect equipped with gallium ion liquid metal source.
Motorized aperture changer with ultra-high reproducibility. Beam Blanker and Faraday cup included as standard.

• Micro/nano machining
  
• Ion beam lithography

GIS Option

Standard multi-gas injection system is suitable for different applications like:

• Deposition of conductive or non-conductive materials
  
• Selective or enhanced etching using various gasses
• optional Mono-GIS system available
  

Nanomanipulator Option

Several types of nano-manipulators are available depending on the use

• Handling function (e.g. TEM lamella lift-out)
  
• Material testing
  
• Tools function
  
• Nanoprobing and testing

Typical Applications of the VELA FIB-SEM

• Micro/nano-structuring
• Nanoprototyping
  
• Inspection and failure analysis
• Micro/nano tomography
• Local cross-sectioning, thin film thickness measurement
• TEM lamella preparation
• Forensic applications
• Other applications from basic research, materials science etc.
  

VELA 3 FIB-SEM Variants

VELA 3 XMH

A high vacuum model operating at chamber vacuum of approx. x 10^-3Pa   for observation of conductive samples.

VELA 3 XMU

A variable pressure model, that combines the advantages of the high vacuum model with extended facility for low vacuum operation. In the low vacuum mode, non-conductive specimens can be observed in their natural, uncoated state at chamber pressures up to 500 Pa.