The LYRA 3 FIB-FESEM

The LYRA 3 FEG is a favorable combination of SEM and FIB for demanding users. It is based on a high resolution Schottky FEG-SEM column and a high performance FIB column.

System Description

• System has a fully integrated software control SEM / FIB / GIS for all jobs
• New generation of DrawBeam lithography module for pattern programming.
• System is built upon the extra large specimen chamber with optimized microanalytical ports.

FEG SEM Part

The SEM column on the is based on the MIRA 3 Wide Field Optics^TM design  with  a Schottky field emission gun.

• Imaging function
  
• Micro-analytical function
  
• Navigation function
  
• E-Beam lithography available with an optional Beam Blanker
  

FIB Part

A unique ion optic column differentially pumped (2 ion pumps) for ultra-low ion scattering effect equipped with gallium ion liquid metal source.
Motorized aperture changer with ultra-high reproducibility. Beam Blanker and Faraday cup included as standard.

• Micro/nano machining
  
• Ion beam lithography

GIS Option

Standard multi-gas injection system is suitable for different applications like:

• Deposition of conductive or non-conductive materials
  
• Selective or enhanced etching using various gasses
• optional Mono-GIS system available
  

Nanomanipulator Option

Several types of nano-manipulators are available depending on the use:

• Handling function (e.g. TEM lamella lift-out)
  
• Material testing
  
• Tools function
  
• Nanoprobing and testing

Typical Applications of the LYRA FIB-FESEM

• Micro/nano-structuring
• Nanoprototyping
  
• Inspection and failure analysis
• Nano-tomography
• Local cross-sectioning, thin film thickness measurement
• TEM lamella preparation
• Forensic applications
• Other applications from basic research, materials science etc.
  

LYRA 3 FIB-FESEM Variants

LYRA 3 XMH

A high vacuum model operating at chamber vacuum of approx. x 10^-3Pa   for observation of conductive samples.

LYRA 3 XMU

A variable pressure model, that combines the advantages of the high vacuum model with extended facility for low vacuum operation. In the low vacuum mode, non-conductive specimens can be observed in their natural, uncoated state at chamber pressures up to 150 Pa.